OF4TP - Plasma Techniques

Course specification
Course title Plasma Techniques
Acronym OF4TP
Study programme Electrical Engineering and Computing
Module Physical Electronics
Type of study bachelor academic studies
Lecturer (for classes)
Lecturer/Associate (for practice)
Lecturer/Associate (for OTC)
    ESPB 6.0 Status elective
    Condition Passed exam: Physical electronics of ionized gasses and plasma
    The goal Introduce students to basic features of ionized gasses and plasma technics which are used in modern technologies. Application of acquired knowledge about the characteristics of plasma in the development of future engineering.
    The outcome Knowledge of basic principles of thin film deposition in plasma, plasma spraying and plasma etching. Basical knowledge of the plasma technics of the manufacturing of the integrated circuits with large number of components. Nanosheets films in plasma techniques.
    Contents of lectures Gas discharge fundamentals, Plasma sources, Reactive Ion Etcher discharges, Plasma chemistry, Plasma procesing in microelectronic fabrication, Kinetic theory and collisions, ECR sources, Inductively coupled plasmas, Helicon wave sources, Plasma diagnostics
    Contents of exercises Practical exercises, the research work in lab
    1. Reactive Sputter Deposition, Diederik Depla (Editor), Stijn Mahieu (Editor), Springer 2008. (Original title)
    2. Lecture Notes on Principles of Plasma Processing, Jane P. Chang, Francis F. Chen, Spinger 2003 (Original title)
    Number of hours per week during the semester/trimester/year
    Lectures Exercises OTC Study and Research Other classes
    3 2
    Methods of teaching Lectures, Exercises, projects
    Knowledge score (maximum points 100)
    Pre obligations Points Final exam Points
    Activites during lectures 0 Test paper 50
    Practical lessons 0 Oral examination 0
    Projects 10
    Colloquia 40
    Seminars 0