OF4TP - Plasma Techniques

Course specification
Course title		Plasma Techniques
Acronym		OF4TP
Study programme		Electrical Engineering and Computing
Module		Physical Electronics
Type of study		bachelor academic studies
Lecturer (for classes)		professor PhD Jovan Cvetić
Lecturer/Associate (for practice)		professor PhD Jovan Cvetić asst. professor PhD Milan Ignjatović
Lecturer/Associate (for OTC)
ESPB		6.0	Status	elective
Condition		Passed exam: Physical electronics of ionized gasses and plasma
The goal		Introduce students to basic features of ionized gasses and plasma technics which are used in modern technologies. Application of acquired knowledge about the characteristics of plasma in the development of future engineering.
The outcome		Knowledge of basic principles of thin film deposition in plasma, plasma spraying and plasma etching. Basical knowledge of the plasma technics of the manufacturing of the integrated circuits with large number of components. Nanosheets films in plasma techniques.
Contents
Contents of lectures		Gas discharge fundamentals, Plasma sources, Reactive Ion Etcher discharges, Plasma chemistry, Plasma procesing in microelectronic fabrication, Kinetic theory and collisions, ECR sources, Inductively coupled plasmas, Helicon wave sources, Plasma diagnostics
Contents of exercises		Practical exercises, the research work in lab
Literature
Reactive Sputter Deposition, Diederik Depla (Editor), Stijn Mahieu (Editor), Springer 2008. (Original title) Lecture Notes on Principles of Plasma Processing, Jane P. Chang, Francis F. Chen, Spinger 2003 (Original title)
Number of hours per week during the semester/trimester/year
Lectures	Exercises	OTC	Study and Research	Other classes
3	2
Methods of teaching		Lectures, Exercises, projects
Knowledge score (maximum points 100)
Pre obligations		Points	Final exam	Points
Activites during lectures		0	Test paper	50
Practical lessons		0	Oral examination	0
Projects		10
Colloquia		40
Seminars		0